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Optical Science and Engineering ETDs
Publication Date
2-9-2010
Abstract
Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.
Degree Name
Optical Science and Engineering
Level of Degree
Masters
Department Name
Optical Science and Engineering
Document Type
Thesis
Language
English
Recommended Citation
Weber, Reed Alan. "Nonlinear microscopy for material characterization." (2010). https://digitalrepository.unm.edu/ose_etds/46