Radio Frequency Sputtering Deposition And Characterization Of Thin Ferroelectric Titanate Film On Silicon Substrates

Author

Cheng-Cheng Hu

Publication Date

4-7-1979

Abstract

This work was done to achieve two goals: (1) To investigate and document the optimum deposition conditions for thin ferroelectric BaTi03 film on doped silicon substrates by r.f. sputtering; (2) to characterize the electrical properties of the metal-insulator-semiconductor (MIS) structure with BaTi03 as insulator and the memory characteristics involved.

Document Type

Dissertation

Language

English

Degree Name

Electrical Engineering

Level of Degree

Doctoral

Department Name

Electrical and Computer Engineering

First Committee Member (Chair)

Wayne Willis Grannemann

Second Committee Member

Harold Dean Southward

Third Committee Member

D. Neaman

Fourth Committee Member

David Barnes

Comments

Sandia Laboratories funding, Department of Electrical Engineering and Computer Science teaching assistantship

Recommended Citation

Hu, Cheng-Cheng. "Radio Frequency Sputtering Deposition And Characterization Of Thin Ferroelectric Titanate Film On Silicon Substrates." (1979). https://digitalrepository.unm.edu/ece_etds/756